AFM oxidation of Ti for nanoscale IC applications

Daniel Hill; Sascha Sadewasser; Xavier Aymerich

doi:10.1201/9781351074636

AFM oxidation of Ti for nanoscale IC applications

Daniel Hill, Sascha Sadewasser, Xavier Aymerich

Aston Institute of Photonic Technologies (AiPT)

Research output: Chapter in Book/Published conference output › Chapter

Abstract

Nanocapacitors are integral devices of nanoscale MOS based integrated circuits. They are yet to be realised and in this article we report our attempts to do so through the use of atomic force microscopy (AFM) anodic oxidation to isolate nano-sized squares of polysilicon, titanium and aluminium on Si/SiO₂. The focus o f this work is on the conductive AFM performed topographical and electrical characterization of these structures.

Original language	English
Title of host publication	Microscopy of Semiconducting Materials 2003
Publisher	CRC Press
Pages	665-668
Number of pages	4
ISBN (Electronic)	9781351083089
ISBN (Print)	0750309792, 9781315895536
DOIs	https://doi.org/10.1201/9781351074636
Publication status	Published - 1 Jan 2003

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AFM oxidation of Ti for nanoscale IC applications

Abstract

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