Abstract
The investigation of the nature of the transient period found in reflectance and reflectance anisotropy measurements of GaAs and AlGaAs surfaces during growth by chemical beam epitaxy (CBE) at high III:V BEP ratios.
Original language | English |
---|---|
Qualification | Ph.D. |
Awarding Institution |
|
Publisher | |
Publication status | Published - 2000 |