Nanomechanical and nanotribological testing of ultra-thin carbon-based and MoST films for increased MEMS durability

Keyphrases

• Nanoscratch Test 100%
• Nanotribological 100%
• Amorphous Carbon Film 100%
• Carbon-based 100%
• Film Failure 100%
• Ultrathin Carbon Layers 100%
• Filtered Cathodic Vacuum Arc 100%
• Nanomechanics 100%
• Stress-related 50%
• Multiple Radii 50%
• Spherical Indenter 50%
• Mechanical Behavior 50%
• Low Stress 50%
• Interfacial Behavior 50%
• MEMS Devices 50%
• Promising Strategies 50%
• Silicon Surface 50%
• Indenter 50%
• Surface Low 50%
• Si-based 50%
• Low Surface Energy 50%
• Film Thickness 50%
• Stiction Force 50%
• Nanoscratch 50%
• Very Thin Films 50%
• Soft Film 50%
• Probe Radius 50%
• Energy Stress 50%
• Delamination Defect 50%
• Indenter Radius 50%
• Non-elastic 50%
• Arc Fields 50%
• Closed Field Unbalanced Magnetron Sputtering (CFUBMS) 50%
• Microelectromechanical Devices 50%
• Elastic Deformation 50%

Engineering

• Thin Films 100%
• Microelectromechanical System 100%
• Critical Load 100%
• Amorphous Carbon 100%
• Delamination 50%
• Magnetron 50%
• Stiction 50%
• Silicon Surface 50%
• Elastic Deformation 50%
• Interfacial Energy 50%

Material Science

• Film 100%
• Microelectromechanical System 100%
• Thin Films 33%
• Silicon 33%
• Amorphous Carbon 33%
• Carbon Films 33%
• Scratch Testing 16%
• Surface Energy 16%
• Film Thickness 16%
• Magnetron Sputtering 16%
• Elastic Deformation 16%
• Delamination 16%