Point-by-point inscription of 250-nm-period structure in bulk fused silica by tightly-focused femtosecond UV pulses: experiment and numerical modeling

David N. Nikogosyan; Mykhaylo Dubov; Holger Schmitz; Vladimir Mezentsev; Ian Bennion; Padraig Bolger; Anatoly Zayats

doi:10.2478/s11534-009-0031-y

Point-by-point inscription of 250-nm-period structure in bulk fused silica by tightly-focused femtosecond UV pulses: experiment and numerical modeling

David N. Nikogosyan, Mykhaylo Dubov, Holger Schmitz, Vladimir Mezentsev, Ian Bennion, Padraig Bolger, Anatoly Zayats

Aston Institute of Photonic Technologies (AiPT)

Research output: Contribution to journal › Article › peer-review

Abstract

By conducting point-by-point inscription in a continuously moving slab of a pure fused silica at the optimal depth (170 Î¼m depth below the surface), we have fabricated a 250-nm-period nanostructure with 30 nJ, 300 fs, 1 kHz pulses from frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports. The performed numerical modeling confirms the obtained experimental results.

Original language	English
Pages (from-to)	169-177
Number of pages	9
Journal	Central European Journal of Physics
Volume	8
Issue number	2
DOIs	https://doi.org/10.2478/s11534-009-0031-y
Publication status	Published - 10 Apr 2010

Bibliographical note

The original publication is available at www.springerlink.com © Versita Warsaw and Springer-Verlag Berlin Heidelberg.

Keywords

femtosecond UV laser
microfabrication
fused silica
nanostructure

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10.2478/s11534-009-0031-y

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The original publication is available at www.springerlink.com © Versita Warsaw and Springer-Verlag Berlin Heidelberg.

http://dx.doi.org/10.2478/s11534-009-0031-y

Cite this

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AU - Nikogosyan, David N.

AU - Dubov, Mykhaylo

AU - Schmitz, Holger

AU - Mezentsev, Vladimir

AU - Bennion, Ian

AU - Bolger, Padraig

AU - Zayats, Anatoly

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AB - By conducting point-by-point inscription in a continuously moving slab of a pure fused silica at the optimal depth (170 Î¼m depth below the surface), we have fabricated a 250-nm-period nanostructure with 30 nJ, 300 fs, 1 kHz pulses from frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports. The performed numerical modeling confirms the obtained experimental results.

KW - femtosecond UV laser

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Point-by-point inscription of 250-nm-period structure in bulk fused silica by tightly-focused femtosecond UV pulses: experiment and numerical modeling

Abstract

Bibliographical note

Keywords

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